Koch Chemie Heavy Cut Pad 45 x 25 mm - Polishing pad red

Abrasive polishing pad for removing heavy deep scratches using Heavy Cut H9.02. The low height of 23 mm generates low torque forces, allowing very good handling and maximum stability. The special density of the foam material ensures long-lasting firmness under relative compression during polishing. Optimized reticulation (open cells) and cell count contribute to high abrasiveness and very good hygiene factors. The milled edge allows for greater flexibility of the pad, enabling better adaptation to contours. Color options that match the compounds ensure a safe process.